Atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) of poly(alkyl acrylates): An experimental study

Authors

F. Loyer, G. Frache, P. Choquet, and N. D. Boscher

Reference

Macromolecules, vol. 50, no. 11, pp 4351–4362, 2017

Description

A novel atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) approach toward the growth of conventional polymer layers is characterized and interpreted. A set of three methacrylate monomers (methyl, butyl, and glycidyl methacrylate) were investigated using ultrashort plasma discharges (ca. 100 ns) pulsed at various frequencies, covering a range of duty cycle from 0.1% to 0.000 316%. An unprecedented weight-average molar mass of 94 000 g mol^–1 coupled to an outstanding thin film conformality and an excellent chemical functionalities retention was achieved for the best deposition conditions. Insights into the growth mechanisms in AP-PiCVD and their dependence on the monomer’s intrinsic properties are provided.

Link

doi:10.1021/acs.macromol.7b00461