Metal-organic covalent network chemical vapor deposition for gas separation
Authors
N. D. Boscher, M. Wang, A. Perrotta, K. Heinze, M. Creatore, and K. K. Gleason
Reference
Advanced Materials, vol. 28, no. 34, 2016
Description
The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
