Site-selective atmospheric pressure plasma-enhanced chemical vapor deposition process for micrometric deposition of plasma-polymerized methyl methacrylate
Authors
Acharya K., Bulou S., Gaulain T., Gérard M., Choquet P.
Reference
Plasma Processes and Polymers, vol. 18, n° 2, art. no. 2000143, 2021
Description
An atmospheric pressure plasma chemical vapor deposition process designed for the site-selective deposition of organic functional materials with a sub-millimetric lateral resolution is presented in this study. Injecting methyl methacrylate vapor in plasma post-discharge allowed to synthesize plasma-polymerized methyl methacrylate (ppMMA) coatings on metallic, dielectric, and polymer substrates at close to room temperature (40°C). A circular dot, as small as 400 µm in diameter, of ppMMA is deposited and characterized by Fourier-transform infrared spectroscopy, X-ray photoelectron spectroscopy, and high-resolution mass spectrometry. Oligomeric species of poly-MMA up to n = 18 have been detected, evidencing the particularly “soft” polymerization offered by the presented process.
