As a mission-driven Research and Technology Organisation (RTO), one of the main objectives of the Luxembourg Institute of Science and Technology (LIST) is technology transfer. In other words, the aim is the valorisation of innovative research results and creation of impact for the society through the transfer to companies.
Two patent applications filed by LIST at the Luxembourgish Patent Office were subsequently submitted at the World Intellectual Property Organization (WIPO) and have recently been published in the domains of materials and environment:
Abstract: The invention is directed to a process of atomic layer deposition for the deposition of silicon oxide on a substrate, performed at room temperature, involving at least three precursors, being silicon tetrachloride, water and one Lewis base agent, being preferentially ammonia. Said process comprises the steps of exposing on said substrate during an exposure time (a) said one Lewis base agent, (b) said silicon tetrachloride, and (c) said water. Said process is remarkable in that at least one step of purge with nitrogen gas is performed after each of the steps (a), (b) and (c) during a purge time. The invention is further directed to a film of silicon oxide which is remarkable in that it comprises a low level of chlorine contaminant and a significant degree of porosity with pores, said pores being preferentially micropores, mesopores or nanopores.
Abstract: The invention is directed to a preparation able to produce a biopesticide for controlling plant pathogens, comprising nanoporous materials combined with an enzyme, being configured to transform a natural precursor into a biopesticide product.
These patent applications are now referenced in WIPO’s database and after being examined at national levels, the final step will be for these patents to be granted by the Intellectual Property Office in each of the countries where the grant is sough.
>> For any further information, do not hesitate to contact our technology transfer officers at tto@list.lu.