Investigating the Electromechanical Behavior of Unconventionally Ferroelectric Hf0.5Zr0.5O2-Based Capacitors Through Operando Nanobeam X-Ray Diffraction
Auteurs :
Stylianidis E., Surabhi P., Hamming-Green R., Salverda M., Wei Y., Burema A., Matzen S., Banerjee T., Björling A., Mukherjee B., Dutta S., Aramberri H., Íñiguez J., Noheda B., Carbone D., Nukala P.
Référence :
Advanced Electronic Materials, vol. 9, n° 6, art. no. 2201298, 2023
Lire la suite