Patterning enhanced tetragonality in BiFeO3 thin films with effective negative pressure by helium implantation
Auteurs :
C. Toulouse, J. Fischer, S. Farokhipoor, L. Yedra, F. Carlà, A. Jarnac, E. Elkaim, P. Fertey, J. N. Audinot, T. Wirtz, B. Noheda, V. Garcia, S. Fusil, I. P. Alonso, M. Guennou, and J. Kreisel
Référence :
Physical Review Materials, vol. 5, no. 2, art. no. 024404, 2021
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