Interstitial boron-doped anatase TiO2 thin-film on optical fibre: Atmospheric pressure-plasma enhanced chemical vapour deposition as the key for functional oxides coatings on temperature-sensitive substrates
Auteurs
M. Quesada-Gonzalez, K. Baba, C. Sotelo-Vazquez, P. Choquet, C. J. Carmalt, I. P. Parkin, and N. D. Boscher
Référence
Journal of Materials Chemistry A, 5, no. 10836, 2017
Description
Temperature sensitive poly(methyl methacrylate) (PMMA) optical fibres were coated with anatase crystalline boron doped-TiO2 thin films in a one-step atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) process. Both the undoped and interstitial boron-doped TiO2 thin films showed photoactivity under UV irradiation, with the boron-doped thin films presenting higher photodegradation rates when compared to the undoped samples.
